Fundamentals of Thin Film Formation, 3rd Edition by Tatsuwo Asamaki, Nikkan Kogyo Shimbun

This is a specialized book on thin film technology, Fundamentals of Thin Film Deposition, 3rd Edition (Nikkan Kogyo Shimbun), originally published in 1977.

This long-selling introductory book explains the essential thin film technology for semiconductor manufacturing and materials engineering in an easy-to-understand manner for beginners.

Author: Tatsuo Mamaki
Publisher: Nikkan Kogyo Shimbun
Publication: 3rd Edition released in March 1996
This book is the 3rd printing of the 3rd Edition, published in August 1999.
Format/Pages: A5 size / 361 pages

Main Contents of this Book: This book is largely divided into two parts.
First Half (Vacuum Technology): Explains the basic knowledge of vacuum, which is essential for creating thin films, types of vacuum pumps, vacuum measurement methods, and handling of actual vacuum equipment.
Second Half (Thin Film Technology): Introduces numerous specific thin film deposition methods and their principles, such as evaporation, sputtering, chemical vapor deposition (CVD), thermal oxidation/nitridation, and etching.

Table of Contents:
1. Thin Film Technology
2. Fundamentals of Vacuum
3. Vacuum Pumps and Vacuum Measurement
4. Practical Vacuum Equipment
5. Fundamentals of Thin Films
6. Thin Film Deposition Methods
7. Evaporation
8. Sputtering
9. Thermal Oxidation, Nitridation, and Chemical Vapor Deposition (CVD)
10. Etching
11. Planarization Technology

As shown in the photos, there is no dust jacket. The cover has discoloration and dirt due to age, but the inside is free of dirt, tears, or missing pages, and should be perfectly readable.
We have checked for any writing, but there may be oversights, so please forgive us in that regard.

Please consider purchasing after understanding the above points.